Applying Machine Learning Techniques to solve Specific Problems in Lithography

Interuniversity Microelectronics Centre (imec) is an international research & development organization, active in the fields of nanoelectronics and digital technologies with headquarters in Belgium. IMEC leverages its state-of-the-art R&D infrastructure and its team of more than 5,500 employees and researchers for advanced semiconductor R&D activities, also including system scaling, silicon photonics, artificial intelligence, beyond 5G communications and sensing technologies.

Description of the Internship

Combination of internship and thesis.

The goal of this project research is to explore and invent/utilize different data analysis methods and advanced machine learning architectures/strategies to control advanced process steps during semiconductor manufacturing , more specifically in Lithography.

Pre-requisites

• Basic knowledge in machine learning algorithms, any scripting languages (preferable Python)
• implementation OS environment UNIX/LINUX is mandatory.

What the student will learn

The student accepted for this position will learn conventional process flow and will be responsible to work collaboratively towards developing and applying “Machine learning" based optimization algorithms with a goal to tackle the aforementioned challenges in terms of 1) Reducing computational cost, 2) reduce tool cycle time, 3) predictive process control approach in enabling advanced node semiconductor manufacturing. 4) Improving metrology data.

Team and environment at the company

The team is described on its website.

Application procedure

Send CVs to Dr. Bappaditya Dey (the contact person). Also , you can visit the internship offer online and then search by for "Bappaditya Dey".